Photo of Daniel Lundin

Daniel Lundin

Senior Associate Professor

My research is focused on developing and characterizing plasma discharges, in particular the fascinating thin film plasma deposition technique High Power Impulse Magnetron Sputtering (HiPIMS).

Presentation

I currently hold the position of Guest Professor in the Coatings & Plasma Physics Division at Linköping University. I am also the co-founder of the Swedish thin film technology company Ionautics.

Overview of the HiPIMS process.Overview of the HiPIMS process including sputtering at the magnetron target followed by ionization, particle transport, and finally film deposition on the substrate (work piece).

I obtained my Ph.D. in 2010 at Linköping University. After having worked at the Royal Institute of Technology (KTH), Sweden, Kiel University, Germany, and the National Center for Scientific Research (CNRS)/Paris-Saclay University, France, I returned to Sweden and currently hold the position of Guest Professor in the Coatings & Plasma Physics Division at Linköping University.

Throughout my entire career, I have been at the forefront of international research efforts on developing and characterizing new plasma-based methods for synthesizing thin films, in particular the thin film deposition technique High Power Impulse Magnetron Sputtering (HiPIMS).




Book Cover HiPIMS Daniel LundinFirst book on HiPIMS, released 2020.

HiPIMS

HiPIMS is thin film deposition from standard sputter magnetrons using pulsed plasma discharges, where a large fraction of the material used in the deposition process arrives to the work piece as ions instead of commonly used neutrals. There are several benefits of having an ionized deposition flux, such as smoother and denser elemental as well as reactively deposited compound films, increased control over their phase composition, microstructure, as well as mechanical and optical properties.

 



Current research

My current research is focused on plasma process control for film deposition using reactive gases, such as oxygen or nitrogen, where I have discovered new ways to enable stable and repeatable high-rate deposition of all types of compound coatings. I am also interested in non-invasive process diagnostics that allows real-time process characterization. I believe such tools are the key to digitalized deposition processes, which have the potential to revolutionize the field of thin films in line with the Industry 4.0 concept.

Publications

2023

Jui-Che Chang, Eric Nestor Tseng, Yi-Ling Lo, Sanjay Kumar Nayak, Daniel Lundin, Per O. Å. Persson, Ray-Hua Horng, Lars Hultman, Jens Birch, Ching-Lien Hsiao (2023) HiPIMS-grown AlN buffer for threading dislocation reduction in DC-magnetron sputtered GaN epifilm on sapphire substrate Vacuum, Vol. 217, Article 112553 Continue to DOI
P. Klein, J. Hnilica, Daniel Lundin, P. Dvorak, Michal Zanaska, Ulf Helmersson, P. Vasina (2023) Temporal, spatial and spectroscopic study of plasma emission on Cu target in bipolar HiPIMS Plasma sources science & technology, Vol. 32, Article 075019 Continue to DOI
Hao Du, Rui Shu, Robert Boyd, Arnaud Le Febvrier, Mauricio A. Sortica, Daniel Primetzhofer, Ulf Helmersson, Per Eklund, Daniel Lundin (2023) Corundum-structured AlCrNbTi oxide film grown using high-energy early-arriving ion irradiation in high-power impulse magnetron sputtering Scripta Materialia, Vol. 234, Article 115578 Continue to DOI
V. G. Antunes, M. Rudolph, A. Kapran, H. Hajihoseini, M. A. Raadu, Nils Brenning, J. T. Gudmundsson, Daniel Lundin, T. Minea (2023) Influence of the magnetic field on the extension of the ionization region in high power impulse magnetron sputtering discharges Plasma sources science & technology, Vol. 32, Article 075016 Continue to DOI
Sanath Kumar Honnali, Charlotte Poterie, Arnaud Le Febvrier, Daniel Lundin, Grzegorz Greczynski, Per Eklund (2023) Effect of tilted closed-field magnetron design on the microstructure and mechanical properties of TiZrNbTaN coatings Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, Vol. 41, Article 043402 Continue to DOI

News

External news

IOP Trusted Reviewer: www.comms.iop.org

Winner of Mentor4Research: www.svd.se
Author of first book on High Power Impulse Magnetron Sputtering (Elsevier)

Organisation