Overview of the HiPIMS process including sputtering at the magnetron target followed by ionization, particle transport, and finally film deposition on the substrate (work piece).
I obtained my Ph.D. in 2010 at Linköping University. After having worked at the Royal Institute of Technology (KTH), Sweden, Kiel University, Germany, and the National Center for Scientific Research (CNRS)/Paris-Saclay University, France, I returned to Sweden and currently hold the position of Guest Professor in the Coatings & Plasma Physics Division at Linköping University.
Throughout my entire career, I have been at the forefront of international research efforts on developing and characterizing new plasma-based methods for synthesizing thin films, in particular the thin film deposition technique High Power Impulse Magnetron Sputtering (HiPIMS).
First book on HiPIMS, released 2020.
HiPIMS is thin film deposition from standard sputter magnetrons using pulsed plasma discharges, where a large fraction of the material used in the deposition process arrives to the work piece as ions instead of commonly used neutrals. There are several benefits of having an ionized deposition flux, such as smoother and denser elemental as well as reactively deposited compound films, increased control over their phase composition, microstructure, as well as mechanical and optical properties.
My current research is focused on plasma process control for film deposition using reactive gases, such as oxygen or nitrogen, where I have discovered new ways to enable stable and repeatable high-rate deposition of all types of compound coatings. I am also interested in non-invasive process diagnostics that allows real-time process characterization. I believe such tools are the key to digitalized deposition processes, which have the potential to revolutionize the field of thin films in line with the Industry 4.0 concept.