Thin Film Physics (TUNNF)

Our research concerns design of new multifunctional materials for hard and wear-resistant coatings, energy materials, magnetic materials, electronics, optics, neutron-converting materials, wide-bandgap semiconductors, and more.

Deposition of aluminum nitride by magnetron sputtering Photo credit Samiran Bairagi

Brief overview

The Thin Film Physics Division conducts application-inspired basic research on thin films to fundamentally understand the atomistic nature of materials properties and behavior and learn how to make materials perform better through new methods of synthesis and processing. Our research concerns design of new multifunctional materials for hard and wear-resistant coatings, energy materials, magnetic materials, electronics, optics, neutron-converting materials for the ESS, wide-bandgap semiconductors, and more. Results are explored in collaboration with industry and the properties of structures unique to thin films form the basis for new and improved materials and processes in applications. We work in an excellent infrastructure with access to a large number of deposition systems, and analytical instruments. Many of them are found in the department instrument booking system.

More about our research

Urban Forsberg.

Boosting Europe's semiconductor manufacturing

LiU has deepened its research collaboration with the German graphite manufacturer SGL Carbon, with the long-term aim of strengthening European semiconductor manufacturing. Together, they have developed a purpose-built CVD tool on Campus Valla.

Per Persson infront of Ångströmhuset.

National research infrastructure secures continued funding

The Swedish Research Infrastructure for Advanced Electron Microscopy, ARTEMI, has secured funding from the Swedish Research Council for another two years. It is crucial for advanced research in materials science, inorganic chemistry and physics.

Four researchers

Neutron optics company started by LiU-researchers

Quantum Beam Optics (QBO) aims to bring advanced multilayer neutron optics technology to the international market. Neutron optics is used in a wide variaty of research and the company is promising high performance and cost-effectiveness.

Research at Thin film physics division

Doctoral education

Contact

Staff

Visiting address

Campus Valla, Building F

Mail address

Linköping University
IFM
581 83 Linköping

Publications

2026

Marcus Lorentzon, Naoki Takata, Diederik Depla, Tianqi Zhu, Grzegorz Greczynski, Rainer Hahn, Anton Zubayer, Justinas Palisaitis, Helmut Riedl, Dasom Kim, Lars Hultman, Jens Birch, Naureen Ghafoor (2026) Growth mechanisms and mechanical response of 3D superstructured cubic and hexagonal Hf1-xAlxN thin films Acta Materialia, Vol. 302, Article 121680 (Article in journal) Continue to DOI
Arnaud le Febvrier, Sanath Kumar Honnali, Charlotte Poterie, Tiago V. Fernandes, Robert Frost, Vladyslav Rogoz, Martin Magnuson, Fabien Giovannelli, Joaquim P. Leitão, Jean Francois Barbot, Per Eklund (2026) Strain engineering of ScN thin films and its effect on optical, electrical, and thermoelectric properties Journal of Materials Chemistry A (Article in journal) Continue to DOI
Ali Saffar Shamshirgar, Roman Ivanov, Sofiya Aydinyan, Sohan Ghosh, Florian Chabanais, Rodrigo Ronchi, Joseph Halim, Anna Elsukova, Leiqiang Qin, Khachik Nazaretyan, Marieta Zakaryan, Suren Kharatyan, Per O A Persson, Irina Hussainova, Johanna Rosén (2026) Rapid and scalable combustion synthesis of (Mo2/3Y1/3)2AlC i-MAX as the precursor for vacancy-ordered MXene Journal of Materials Science & Technology, Vol. 255, p. 157-169 (Article in journal) Continue to DOI

2025

Sanjay Kumar, Bartosz Wicher, Grzegorz Greczynski (2025) Time-resolved ion mass spectrometry analysis reveal high Bi2+ and Bi3+ ion fluxes during high-power impulse magnetron sputtering of Bi target Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, Vol. 43, Article 063006 (Article in journal) Continue to DOI
Ching-Hsuan Lee, Sheng-Ti Chung, Chien-Nan Hsiao, Po-Hsun Chen, Po-Liang Liu, Kenneth Järrendahl, Ching-Lien Hsiao, Ray-Hua Horng (2025) Substrate Off-Cut Effect on the Performance of Enhancement-Mode ß-Ga2O3 Metal-Oxide-Semiconductor Field-Effect Transistors ACS Applied Electronic Materials (Article in journal) Continue to DOI
Syuzanna Melkonyan, Marieta Zakaryan, Yeva Grigoryan, Suren Kharatyan, Irina Hussainova, Florian Chabanais, Ali Saffar Shamshirgar, Per O.Å. Persson, Johanna Rosén, Sofiya Aydinyan (2025) Phase and microstructure evolution patterns at combustion synthesis of high-entropy M2AlC (M=Ti/Ta/V/Nb/Cr) MAX phase Journal of Materials Research and Technology, Vol. 39, p. 5800-5807 (Article in journal) Continue to DOI
Shailesh Kalal, Martin Magnuson, Alessandro Chesini, Akshaya A, Sanath Kumar Honnali, Sophia Sahoo, Nakul Jain, Dibyendu Bhattacharyya, Andrei Gloskovskii, Mukul Gupta, Feng Wang, Michele Orlandi, Grzegorz Greczynski, Kenneth Järrendahl, Per Eklund, Jens Birch, Ching-Lien Hsiao (2025) Defect Engineering in Ti-Doped Ta3N5 Thin Films for Enhanced Photoelectrochemical Water Splitting: Electronic Structure Modulation and Charge Carrier Dynamics Small Structures, Article e202500504 (Article in journal) Continue to DOI
Nick Goossens, Bensu Tunca, Michael Stuer, Per O A Persson, Jin Won Seo, Shuigen Huang, Konstantina Lambrinou, Jozef Vleugels (2025) Sterically Stabilized (Zr,Ti)-(Al,Sn,Pb,Bi)-C MAX Phase Solid Solutions with Zn Additions and Enhanced Chemical Complexity on the A-Site Journal of the American Chemical Society (Article in journal) Continue to DOI
Sanath Kumar Honnali, Robert Boyd, Daniel Lundin, Grzegorz Greczynski, G. Ramanath, Per Eklund (2025) Low-temperature synthesis of Al-rich rock salt Cr1-xAlxN films with selective metal ion bombardment by synchronized substrate bias pulsing Applied Physics Letters, Vol. 127, Article 151906 (Article in journal) Continue to DOI
Pamburayi Mpofu, Tommy Larsson, Oscar Alm, Jonas Lauridsen, Kenichiro Mizohata, Ben F. Spencer, Hans Högberg, Kostas Sarakinos, Henrik Pedersen (2025) On the reliability of Vegard's law in compositional analysis of chemical vapor deposited AlxTi1-xN Surface & Coatings Technology, Vol. 518, Article 132898 (Article in journal) Continue to DOI

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