Photo of Faezeh Alijan Farzad Lahiji

Faezeh Alijan Farzad Lahiji

PhD student

In my research, I’m interested in synthesizing and characterizing oxide thin films using pulsed DC reactive magnetron sputtering.

I am doing my PhD in the unit of energy materials, Thin Film Physics Division, Department of Physics, Chemistry, and Biology (IFM). My research focuses on synthesizing and characterizing oxide thin films using pulsed DC reactive magnetron sputtering. I have developed synthesis methodologies for the epitaxial growth and properties of benchmark NaCl-structured materials on silicon (Si) and various orientations of sapphire (Al2O3), including epitaxy on r-plane Sapphire. In addition, I am leveraging my experience in the growth of van der Waals epitaxy of 2D and layered materials. I am particularly interested in these materials because they exhibit properties intrinsically different from their 3D counterparts, expanding their multifunctionality for the next generation of flexible and transparent electronics for wearable, bendable, and stretchable applications. To achieve an in-depth understanding of the crystalline quality, structure, and atomic registry at the interfaces, I apply various characterization techniques such as XRD, XRR, pole figure analysis, SEM, AFM, STEM, RBS, and SE.

Research

Ongoing research activity

Conventional epitaxial growth poses significant challenges in achieving the desired properties due to the need for structural similarity and precise alignment between the film and substrate. To address this, I have explored van der Waals epitaxy, which offers new possibilities for flexible oxide thin films known for their lightness, flexibility, and durability.                                   

In van der Waals epitaxy, atomic layers are connected by weak intermolecular forces rather than traditional lattice-matching forces, resulting in distinct growth behaviors and properties. Understanding the van der Waals interactions that enable strain-free epitaxial growth is crucial for designing materials for electronic and optoelectronic applications, especially in today's fast-growing artificial intelligence and next-generation communications technologies.

Publications

2024

Faezeh Alijan Farzad Lahiji (2024) Growth and epitaxy of oxide thin films from conventional to van der Waals epitaxy
Faezeh A.F. Lahiji, Biplab Paul, Arnaud Le Febvrier, Per Eklund (2024) Conventional epitaxy of NiO thin films on muscovite mica and c-Al2O3 substrates Thin Solid Films, Vol. 808, Article 140566 (Article in journal) Continue to DOI
Faezeh Alijan Farzad Lahiji, Biplab Paul, Arnaud Le Febvrier, Per Eklund (2024) Unusual tilted growth and epitaxial relationship of NaCl B1-structured NiO and CrN on r-plane Al2O3 Journal of Applied Physics, Vol. 135, Article 065302 (Article in journal) Continue to DOI

2023

Faezeh Alijan Farzad Lahiji, Samiran Bairagi, Roger Magnusson, Mauricio A. Sortica, Daniel Primetzhofer, Erik Ekström, Biplab Paul, Arnaud Le Febvrier, Per Eklund (2023) Growth and optical properties of NiO thin films deposited by pulsed dc reactive magnetron sputtering Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, Vol. 41, Article 063402 (Article in journal) Continue to DOI
Faezeh Alijan Farzad Lahiji (2023) Epitaxy of oxide and nitride thin films grown by magnetron sputtering

Teaching

Teaching activity

Lab instructor for MSc-level courses in:

  • Growth and Characterization of Nanomaterials
  • Physical Metallurgy
  • Experimental Physics