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Linköping University
Rommel Paulo Viloan
Rommel Paulo Viloan
Postdoc
Publications
Research
Education
Publications
2021
Rommel Paulo Viloan, Ulf Helmersson, Daniel Lundin (2021)
Copper thin films deposited using different ion acceleration strategies in HiPIMS
Surface & Coatings Technology, Vol. 422, Article 127487
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Tetsuhide Shimizu, Kazuki Takahashi, Robert Boyd, Rommel Paulo Viloan, Julien Keraudy, Daniel Lundin, Ming Yang, Ulf Helmersson (2021)
Low temperature growth of stress-free single phase alpha-W films using HiPIMS with synchronized pulsed substrate bias
Journal of Applied Physics, Vol. 129, Article 155305
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Rommel Paulo B. Viloan (2021)
Engineered ion-bombardment as a tool in thin film deposition
Rommel Paulo B. Viloan, Michal Zanáška, Daniel Lundin, Ulf Helmersson (2021)
Pulse length selection for optimizing the accelerated ion flux fraction of a bipolar HiPIMS discharge
Plasma sources science & technology, Vol. 29, Article 125013
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2020
Rommel Paulo B. Viloan, Daniel Lundin, Julien Keraudy, Ulf Helmersson (2020)
Tuning the stress in TiN films by regulating the doubly charged ion fraction in a reactive HiPIMS discharge
Journal of Applied Physics, Vol. 127, Article 103302
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Tags
Plasma and Coatings Physics (PLASM)
Department of Physics, Chemistry and Biology (IFM)
Linköping University (LIU)
Employee
Rommel Paulo Viloan (romvi43)
Postdoc
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