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Linköping University
Rommel Paulo Viloan

Photo of Rommel Paulo Viloan

Rommel Paulo Viloan

Principal Research Engineer

Contact

rommel.paulo.viloan@liu.se
+46 13 28 29 06
2906

Organisation

Department of Physics, Chemistry and Biology (IFM)
Plasma and Coatings Physics (PLASM)

Visiting address

Campus Valla, Fysikhuset, Entrance 57, Room N410

Publications
Research
Education

Publications Show/Hide content

2021

Rommel Paulo Viloan, Ulf Helmersson, Daniel Lundin (2021) Copper thin films deposited using different ion acceleration strategies in HiPIMS Surface & Coatings Technology , Vol. 422

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Tetsuhide Shimizu, Kazuki Takahashi, Robert Boyd, Rommel Paulo Viloan, Julien Keraudy, Daniel Lundin, Ming Yang, Ulf Helmersson (2021) Low temperature growth of stress-free single phase alpha-W films using HiPIMS with synchronized pulsed substrate bias Journal of Applied Physics , Vol. 129

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Rommel Paulo B. Viloan (2021) Engineered ion-bombardment as a tool in thin film deposition

Rommel Paulo B. Viloan, Michal Zanáška, Daniel Lundin, Ulf Helmersson (2021) Pulse length selection for optimizing the accelerated ion flux fraction of a bipolar HiPIMS discharge Plasma sources science & technology (Print) , Vol. 29

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2020

Rommel Paulo B. Viloan, Daniel Lundin, Julien Keraudy, Ulf Helmersson (2020) Tuning the stress in TiN films by regulating the doubly charged ion fraction in a reactive HiPIMS discharge Journal of Applied Physics , Vol. 127

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To institutional repository

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Plasma and Coatings Physics (PLASM)
Department of Physics, Chemistry and Biology (IFM)
Linköping University (LIU)
Employee
Rommel Paulo Viloan (romvi43)
Principal Research Engineer

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Linköping University

SE-581 83 Linköping
Sweden

infocenter@liu.se
+46 13 281000

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