Photo of Rommel Paulo Viloan

Rommel Paulo Viloan

Publications

2026

Sanath Kumar Honnali, Melvin Maginet, Rommel Paulo Viloan, Arnaud le Febvrier, Daniel Lundin, Grzegorz Greczynski, Per Eklund (2026) Influence of pulsed substrate biasing on strain and mechanical properties of low-temperature-grown TiZrNbTaNx films by high-power impulse magnetron sputtering Surface & Coatings Technology, Vol. 538, Article 133845 (Article in journal) https://dx.doi.org/10.1016/j.surfcoat.2026.133845
Kateryna Barynova, Tetsuhide Shimizu, Rommel Paulo Viloan, Michal Zanaska, Joel Fischer, Martin Rudolph, Daniel Lundin, Jon Tomas Gudmundsson (2026) High power impulse magnetron sputtering from a chromium target Plasma sources science & technology, Vol. 35, Article 025028 (Article in journal) https://dx.doi.org/10.1088/1361-6595/ae42e5

2021

Rommel Paulo Viloan, Ulf Helmersson, Daniel Lundin (2021) Copper thin films deposited using different ion acceleration strategies in HiPIMS Surface & Coatings Technology, Vol. 422, Article 127487 (Article in journal) https://dx.doi.org/10.1016/j.surfcoat.2021.127487
Tetsuhide Shimizu, Kazuki Takahashi, Robert Boyd, Rommel Paulo Viloan, Julien Keraudy, Daniel Lundin, Ming Yang, Ulf Helmersson (2021) Low temperature growth of stress-free single phase alpha-W films using HiPIMS with synchronized pulsed substrate bias Journal of Applied Physics, Vol. 129, Article 155305 (Article in journal) https://dx.doi.org/10.1063/5.0042608
Rommel Paulo B. Viloan (2021) Engineered ion-bombardment as a tool in thin film deposition (Doctoral thesis, comprehensive summary) https://dx.doi.org/10.3384/diss.diva-175464

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