Photo of Rommel Paulo Viloan

Rommel Paulo Viloan

Postdoc

Publications

2026

Kateryna Barynova, Tetsuhide Shimizu, Rommel Paulo Viloan, Michal Zanaska, Joel Fischer, Martin Rudolph, Daniel Lundin, Jon Tomas Gudmundsson (2026) High power impulse magnetron sputtering from a chromium target Plasma sources science & technology, Vol. 35, Article 025028 (Article in journal) Continue to DOI

2021

Rommel Paulo Viloan, Ulf Helmersson, Daniel Lundin (2021) Copper thin films deposited using different ion acceleration strategies in HiPIMS Surface & Coatings Technology, Vol. 422, Article 127487 (Article in journal) Continue to DOI
Tetsuhide Shimizu, Kazuki Takahashi, Robert Boyd, Rommel Paulo Viloan, Julien Keraudy, Daniel Lundin, Ming Yang, Ulf Helmersson (2021) Low temperature growth of stress-free single phase alpha-W films using HiPIMS with synchronized pulsed substrate bias Journal of Applied Physics, Vol. 129, Article 155305 (Article in journal) Continue to DOI
Rommel Paulo B. Viloan (2021) Engineered ion-bombardment as a tool in thin film deposition
Rommel Paulo B. Viloan, Michal Zanáška, Daniel Lundin, Ulf Helmersson (2021) Pulse length selection for optimizing the accelerated ion flux fraction of a bipolar HiPIMS discharge Plasma sources science & technology, Vol. 29, Article 125013 (Article in journal) Continue to DOI

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