Rommel Paulo Viloan

Rommel Paulo B. Viloan, Michal Zanáška, Daniel Lundin, Ulf Helmersson (2021) Pulse length selection for optimizing the accelerated ion flux fraction of a bipolar HiPIMS discharge Plasma sources science & technology (Print) , Vol. 29

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Rommel Paulo B. Viloan, Daniel Lundin, Julien Keraudy, Ulf Helmersson (2020) Tuning the stress in TiN films by regulating the doubly charged ion fraction in a reactive HiPIMS discharge Journal of Applied Physics , Vol. 127

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Rommel Paulo B. Viloan, Jiabin Gu, Robert Boyd, Julien Keraudy, Liuhe Li, Ulf Helmersson (2019) Bipolar high power impulse magnetron sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias Thin Solid Films , Vol. 688

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Julien Keraudy, Rommel Paulo Viloan, Michael A. Raadu, Nils Brenning, Daniel Lundin, Ulf Helmersson (2019) Bipolar HiPIMS for tailoring ion energies in thin film deposition Surface & Coatings Technology , Vol. 359 , s. 433-437

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Michelle M Villamayor, Julien Keraudy, Tetsuhide Shimizu, Rommel Paulo Viloan, Robert Boyd, Daniel Lundin, Joseph E Greene, Ivan Petrov, Ulf Helmersson (2018) Low temperature (T-s/T-m < 0.1) epitaxial growth of HfN/MgO(001) via reactive HiPIMS with metal-ion synchronized substrate bias Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films , Vol. 36

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Rommel Paulo Viloan

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Rommel Paulo Viloan

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