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Rommel Paulo Viloan

Postdoktor

Publikationer

2021

Rommel Paulo Viloan, Ulf Helmersson, Daniel Lundin (2021) Copper thin films deposited using different ion acceleration strategies in HiPIMS Surface & Coatings Technology, Vol. 422, Artikel 127487 (Artikel i tidskrift) Vidare till DOI
Tetsuhide Shimizu, Kazuki Takahashi, Robert Boyd, Rommel Paulo Viloan, Julien Keraudy, Daniel Lundin, Ming Yang, Ulf Helmersson (2021) Low temperature growth of stress-free single phase alpha-W films using HiPIMS with synchronized pulsed substrate bias Journal of Applied Physics, Vol. 129, Artikel 155305 (Artikel i tidskrift) Vidare till DOI
Rommel Paulo B. Viloan (2021) Engineered ion-bombardment as a tool in thin film deposition
Rommel Paulo B. Viloan, Michal Zanáška, Daniel Lundin, Ulf Helmersson (2021) Pulse length selection for optimizing the accelerated ion flux fraction of a bipolar HiPIMS discharge Plasma sources science & technology, Vol. 29, Artikel 125013 (Artikel i tidskrift) Vidare till DOI

2020

Rommel Paulo B. Viloan, Daniel Lundin, Julien Keraudy, Ulf Helmersson (2020) Tuning the stress in TiN films by regulating the doubly charged ion fraction in a reactive HiPIMS discharge Journal of Applied Physics, Vol. 127, Artikel 103302 (Artikel i tidskrift) Vidare till DOI

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