Rommel Paulo Viloan
Postdoktor
Publikationer
Rommel Paulo Viloan, Ulf Helmersson, Daniel Lundin
(2021)
Copper thin films deposited using different ion acceleration strategies in HiPIMS
Surface & Coatings Technology, Vol. 422
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Tetsuhide Shimizu, Kazuki Takahashi, Robert Boyd, Rommel Paulo Viloan, Julien Keraudy, Daniel Lundin, Ming Yang, Ulf Helmersson
(2021)
Low temperature growth of stress-free single phase alpha-W films using HiPIMS with synchronized pulsed substrate bias
Journal of Applied Physics, Vol. 129
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Rommel Paulo B. Viloan
(2021)
Engineered ion-bombardment as a tool in thin film deposition
Rommel Paulo B. Viloan, Michal Zanáška, Daniel Lundin, Ulf Helmersson
(2021)
Pulse length selection for optimizing the accelerated ion flux fraction of a bipolar HiPIMS discharge
Plasma sources science & technology, Vol. 29
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Rommel Paulo B. Viloan, Daniel Lundin, Julien Keraudy, Ulf Helmersson
(2020)
Tuning the stress in TiN films by regulating the doubly charged ion fraction in a reactive HiPIMS discharge
Journal of Applied Physics, Vol. 127
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