Rommel Paulo Viloan
Publikationer
2026
High power impulse magnetron sputtering from a chromium target
Plasma sources science & technology, Vol. 35, Artikel 025028
(Artikel i tidskrift)
https://dx.doi.org/10.1088/1361-6595/ae42e5
2021
Copper thin films deposited using different ion acceleration strategies in HiPIMS
Surface & Coatings Technology, Vol. 422, Artikel 127487
(Artikel i tidskrift)
https://dx.doi.org/10.1016/j.surfcoat.2021.127487
Low temperature growth of stress-free single phase alpha-W films using HiPIMS with synchronized pulsed substrate bias
Journal of Applied Physics, Vol. 129, Artikel 155305
(Artikel i tidskrift)
https://dx.doi.org/10.1063/5.0042608
Engineered ion-bombardment as a tool in thin film deposition
(Doktorsavhandling, sammanläggning)
https://dx.doi.org/10.3384/diss.diva-175464
Pulse length selection for optimizing the accelerated ion flux fraction of a bipolar HiPIMS discharge
Plasma sources science & technology, Vol. 29, Artikel 125013
(Artikel i tidskrift)
https://dx.doi.org/10.1088/1361-6595/abc6f6