Fotografi av Rommel Paulo Viloan

Rommel Paulo Viloan




Rommel Paulo Viloan, Ulf Helmersson, Daniel Lundin (2021) Copper thin films deposited using different ion acceleration strategies in HiPIMS Surface & Coatings Technology, Vol. 422, Artikel 127487 Vidare till DOI
Tetsuhide Shimizu, Kazuki Takahashi, Robert Boyd, Rommel Paulo Viloan, Julien Keraudy, Daniel Lundin, Ming Yang, Ulf Helmersson (2021) Low temperature growth of stress-free single phase alpha-W films using HiPIMS with synchronized pulsed substrate bias Journal of Applied Physics, Vol. 129, Artikel 155305 Vidare till DOI
Rommel Paulo B. Viloan (2021) Engineered ion-bombardment as a tool in thin film deposition
Rommel Paulo B. Viloan, Michal Zanáška, Daniel Lundin, Ulf Helmersson (2021) Pulse length selection for optimizing the accelerated ion flux fraction of a bipolar HiPIMS discharge Plasma sources science & technology, Vol. 29, Artikel 125013 Vidare till DOI


Rommel Paulo B. Viloan, Daniel Lundin, Julien Keraudy, Ulf Helmersson (2020) Tuning the stress in TiN films by regulating the doubly charged ion fraction in a reactive HiPIMS discharge Journal of Applied Physics, Vol. 127, Artikel 103302 Vidare till DOI