Sachin Sharma

Chemical Vapor Deposition of Epitaxial Boron-Carbon-Nitrogen Thin Films

Overview

I work with a Hot-Wall Chemical Vapor Deposition (CVD) setup to grow and characterize Boron Nitride and Boron Carbide thin films. With a focus on investigating the chemistry and process parameters that affect the epitaxial growth of these material systems in CVD.

Affiliations

The image shows a plasma in a coating equipment

Thin Film Physics (TUNNF)

The research in our division concerns design of new multifunctional materials for hard and wear-resistant coatings, energy materials, magnetic materials, electronics, optics, neutron-converting materials, wide-bandgap semiconductors, and more.

The image shows graphene-metal interfaces

Functional Materials unit

We investigate the properties of thin films synthesized using various Vapor Deposition and Sputtering techniques.

Pedersen Group

The Henrik Pedersen research group at Linköping University is working on chemical vapour deposition (CVD) with the aim to develop better CVD routes to, primarily, electronic materials.

Publications

2024

Sachin Sharma, Laurent Souqui, Justinas Palisaitis, Duc Quang Hoang, Ivan Gueorguiev Ivanov, Per O A Persson, Hans Högberg, Henrik Pedersen (2024)

On the origin of epitaxial rhombohedral-B₄C growth by CVD on 4H-SiC Dalton Transactions, Vol. 53, p. 10730-10736 (Article in journal)

https://dx.doi.org/10.1039/d4dt01157k

Sachin Sharma (2024)

Phase Evolution of Boron Nitride and Carbide during Chemical Vapor Deposition (Doctoral thesis, comprehensive summary)

https://dx.doi.org/10.3384/9789180755221

Sachin Sharma, Justinas Palisaitis, Ivan Gueorguiev Ivanov, Per O Å Persson, Henrik Pedersen, Hans Högberg (2024)

The Influence of Carbon on Polytype and Growth Stability of Epitaxial Hexagonal Boron Nitride Films Advanced Materials Interfaces, Vol. 11, Article 2400091 (Article in journal)

https://dx.doi.org/10.1002/admi.202400091

2022

Laurent Souqui, Sachin Sharma, Hans Högberg, Henrik Pedersen (2022)

Texture evolution in rhombohedral boron carbide films grown on 4H-SiC(0001) and 4H-SiC(0001) substrates by chemical vapor deposition Dalton Transactions, Vol. 51, p. 15974-15982 (Article in journal)

https://dx.doi.org/10.1039/d2dt02107b

Sachin Sharma, Laurent Souqui, Henrik Pedersen, Hans Högberg (2022)

Chemical vapor deposition of sp(2)-boron nitride films on Al2O3 (0001), (11 2 over bar 0), (1 1 over bar 02), and (10 1 over bar 0) substrates Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, Vol. 40, Article 033404 (Article in journal)

https://dx.doi.org/10.1116/6.0001672