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Sachin Sharma

PhD student

Chemical Vapor Deposition of Epitaxial Boron-Carbon-Nitrogen Thin Films 

Overview 

I work with a Hot-Wall Chemical Vapor Deposition (CVD) setup to grow and characterize Boron Nitride and Boron Carbide thin films. With a focus on investigating the chemistry and process parameters that affect the epitaxial growth of these material systems in CVD.

Organisation

The image shows a plasma in a coating equipment

Thin Film Physics (TUNNF)

The research in our division concerns design of new multifunctional materials for hard and wear-resistant coatings, energy materials, magnetic materials, electronics, neutron-converting materials for the ESS, wide-bandgap semiconductors, and more.
The image shows graphene-metal interfaces

Functional Materials unit

We investigate the properties of thin films synthesized using various Vapor Deposition and Sputtering techniques.
Pedersen group

Pedersen Group

The Henrik Pedersen research group at Linköping University is working on chemical vapour deposition (CVD) with the aim to develop better CVD routes to, primarily, electronic materials.

Publications

2024

Sachin Sharma (2024) Phase Evolution of Boron Nitride and Carbide during Chemical Vapor Deposition
Sachin Sharma, Justinas Palisaitis, Ivan Gueorguiev Ivanov, Per O A Persson, Henrik Pedersen, Hans Högberg (2024) The Influence of Carbon on Polytype and Growth Stability of Epitaxial Hexagonal Boron Nitride Films Advanced Materials Interfaces Continue to DOI

2022

Laurent Souqui, Sachin Sharma, Hans Högberg, Henrik Pedersen (2022) Texture evolution in rhombohedral boron carbide films grown on 4H-SiC(0001) and 4H-SiC(0001) substrates by chemical vapor deposition Dalton Transactions, Vol. 51, p. 15974-15982 Continue to DOI
Sachin Sharma, Laurent Souqui, Henrik Pedersen, Hans Högberg (2022) Chemical vapor deposition of sp(2)-boron nitride films on Al2O3 (0001), (11 2 over bar 0), (1 1 over bar 02), and (10 1 over bar 0) substrates Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, Vol. 40, Article 033404 Continue to DOI

2021

Matthieu Moret, Adrien Rousseau, Pierre Valvin, Sachin Sharma, Laurent Souqui, Henrik Pedersen, Hans Högberg, Guillaume Cassabois, Jianhan Li, J. H. Edgar, Bernard Gil (2021) Rhombohedral and turbostratic boron nitride: X-ray diffraction and photoluminescence signatures Applied Physics Letters, Vol. 119, Article 262102 Continue to DOI

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