Surface chemistry is central
Fully controlled and fully understood surface chemistry is at the centre of our research. To this goal we explore various time-resolved CVD approaches, e.g., atomic layer deposition (ALD), surface passivating molecules, and reaction kinetics control to enhance deposition into deep features. We are pioneering surface chemical reactions with free electrons from plasmas, accessing new ways to deposit and etch materials.
We are also studying how CVD processes can be more sustainable by better design of CVD reactors and CVD chemistry, and by developing life cycle assessment (LCA) methods for CVD processes. The aim of our work is easier and better processes to manipulate materials at the atomic scale for e.g., a better and more sustainable fabrication of chips. Such processes have relevance for several of the UN sustainability goals, e.g., Clean Energy (goal 7), and Industrial Innovation (goal 9).
We collaborate closely with computational groups for studies of CVD gas phase- and surface chemistry, and with materials science- and plasma physics groups, as well as with several companies. If you want to do a bachelor- och master thesis with us, or collaborate in some way, please contact Henrik Pedersen.