Pedersen Group: Exploring, understanding and developing chemical vapour deposition

the photo shows the members of Pedersen group
Members in Pedersen group Christian Militzer

The Henrik Pedersen research group at Linköping University is working on chemical vapour deposition (CVD) with the aim to develop better CVD routes to, primarily, electronic materials.

Thin films, or thin layers of materials, are all around us, from the photochromic coating on windows to the hard coating on drills. All electronics are constructed from stacks of thin films with carefully controlled properties. 

One of the most important methods to deposit thin films is CVD, which uses chemical reactions between precursor molecules containing the atoms needed for the film. In our work to develop better CVD routes, we develop new precursor molecules, experiment with new ways of using plasma discharges in CVD, and explore various time-resolved CVD approaches and we perform computational studies of CVD gas phase- and surface chemistry.


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Esko Ahvenniemi, Andrew R. Akbashev, Saima Ali, Mikhael Bechelany, Maria Berdova, Stefan Boyadjiev, David C. Cameron, Rong Chen, Mikhail Chubarov, Veronique Cremers, Anjana Devi, Viktor Drozd, Liliya Elnikova, Gloria Gottardi, Kestutis Grigoras, Dennis M. Hausmann, Cheol Seong Hwang, Shih-Hui Jen, Tanja Kallio, Jaana Kanervo, Ivan Khmelnitskiy, Do Han Kim, Lev Klibanov, Yury Koshtyal, A. Outi I. Krause, Jakob Kuhs, Irina Kaerkkaenen, Marja-Leena Kaariainen, Tommi Kaariainen, Luca Lamagna, Adam A. Lapicki, Markku Leskela, Harri Lipsanen, Jussi Lyytinen, Anatoly Malkov, Anatoly Malygin, Abdelkader Mennad, Christian Militzer, Jyrki Molarius, Malgorzata Norek, Cagla Ozgit-Akgun, Mikhail Panov, Henrik Pedersen, Fabien Piallat, Georgi Popov, Riikka L. Puurunen, Geert Rampelberg, Robin H. A. Ras, Erwan Rauwel, Fred Roozeboom, Timo Sajavaara, Hossein Salami, Hele Savin, Nathanaelle Schneider, Thomas E. Seidel, Jonas Sundqvist, Dmitry B. Suyatin, Tobias Torndahl, J. Ruud van Ommen, Claudia Wiemer, Oili M. E. Ylivaara, Oksana Yurkevich (2017) Recommended reading list of early publications on atomic layer deposition-Outcome of the "Virtual Project on the History of ALD" Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films , Vol. 35 Continue to DOI

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