Sanath Kumar Honnali

My research aims to enhance PVD process efficiency through the elimination of substrate heating and cooling cycles during depositions. I leverage high-energy ion bombardment, achieved via high-power impulse magnetron sputtering (HiPIMS) technique.

One of the key advantages of HiPIMS is the ability to manipulate the materials arriving at workpiece through electric and magnetic fields, allowing better control over the film properties.