Tetsuhide Shimizu
Publications
2021
Low temperature growth of stress-free single phase alpha-W films using HiPIMS with synchronized pulsed substrate bias
Journal of Applied Physics, Vol. 129, Article 155305
(Article in journal)
https://dx.doi.org/10.1063/5.0042608
Experimental verification of deposition rate increase, with maintained high ionized flux fraction, by shortening the HiPIMS pulse
Plasma sources science & technology, Vol. 30, Article 045006
(Article in journal)
https://dx.doi.org/10.1088/1361-6595/abec27
2018
Phase separation within NiSiN coatings during reactive HiPIMS discharges: A new pathway to grow NixSi nanocrystals composites at low temperature
Applied Surface Science, Vol. 454, p. 148-156
(Article in journal)
https://dx.doi.org/10.1016/j.apsusc.2018.05.061
2016
Process stabilization by peak current regulation in reactive high-power impulse magnetron sputtering of hafnium nitride
Journal of Physics D: Applied Physics, Vol. 49, p. 065202-
(Article in journal)
https://dx.doi.org/10.1088/0022-3727/49/6/065202