Publikationer
Tetsuhide Shimizu, Kazuki Takahashi, Robert Boyd, Rommel Paulo Viloan, Julien Keraudy, Daniel Lundin, Ming Yang, Ulf Helmersson
(2021)
Low temperature growth of stress-free single phase alpha-W films using HiPIMS with synchronized pulsed substrate bias
Journal of Applied Physics, Vol. 129
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Tetsuhide Shimizu, Michal Zanaska, R. P. Villoan, Nils Brenning, Ulf Helmersson, Daniel Lundin
(2021)
Experimental verification of deposition rate increase, with maintained high ionized flux fraction, by shortening the HiPIMS pulse
Plasma sources science & technology, Vol. 30
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Julien Keraudy, Robert Boyd, Tetsuhide Shimizu, Ulf Helmersson, P-Y Jouan
(2018)
Phase separation within NiSiN coatings during reactive HiPIMS discharges: A new pathway to grow NixSi nanocrystals composites at low temperature
Applied Surface Science, Vol. 454, s. 148-156
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Tetsuhide Shimizu, Michelle M Villamayor, D. Lundin, Ulf Helmersson
(2016)
Process stabilization by peak current regulation in reactive high-power impulse magnetron sputtering of hafnium nitride
Journal of Physics D: Applied Physics, Vol. 49, s. 065202-
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