Photo of Henrik Pedersen

Henrik Pedersen

Professor

I teach inorganic chemistry and head a research group focusing on various aspects of CVD, chemical vapour deposition, a chemical method for deposition of thin layers of materials.

Chemistry for the semiconductor age

Research

Chemical Vapour Deposition (CVD) is a fundamental process used in the fabrication of surface coatings and thin films of various materials. CVD processes are used to manufacture all types of microelectronic components and are one of the core technologies underlying our everyday lives in the semiconductor age. But CVD is also a key technology for producing cutting tools for metal machining. My research focuses on understanding and controlling the chemical processes involved in CVD and on developing improved and more sustainable CVD processes.

Pedersen shows materials made with CVD. Olov Planthaber
I studied chemistry at Linköping University from 2000 to 2004 and received my PhD in Materials Science in 2008. After working as an industrial researcher at Sandvik Coromant in Stockholm from 2009 to 2010, I returned to LiU and have been a professor of inorganic chemistry since 2018. My research lies at the intersection of chemistry, physics, materials science, and electronics. My research group therefore consists of chemists, materials scientists, and physicists.

One of our ongoing projects investigates atomic layer processing (ALP) of various nitrides, that is, compounds formed between metals and nitrogen. In ALP, atoms are added to and removed from surfaces to build materials with atomic precision. A key focus here is the group 13 nitrides—AlN, GaN, InN—and their alloys, which are important semiconductors; for example, they are the basis for LEDs. Our research primarily concerns the surface-chemical reactions in these processes. We conduct this work in collaboration with several companies, using measurements at MAX IV and quantum chemical modelling together with Professor Lars Ojamäe.

In another project, we are developing a new CVD method that we call e-CVD, in which free electrons in a plasma discharge are used to drive various surface-chemical reactions, for example, to reduce metal ions in adsorbed precursor molecules to a metallic film. This research is carried out in close collaboration with Professor Daniel Lundin, and we study both plasma-chemical and surface-chemical reactions.

We also investigate how CVD processes can be controlled to deposit materials onto surfaces with complex topology—such as narrow, deep holes—in the most effective way. This is needed, among other things, for the fabrication of computer memory. Here we experiment with introducing various chemical inhibitors and different heavy inert gases.

Despite the major role CVD processes play in our society, very little focus has been placed on making them more sustainable. Together with several companies and Dr. Annelie Carlson, we study various CVD processes using life cycle assessment (LCA) to understand them from a sustainability perspective and to identify how they can be made more sustainable, for example by designing CVD reactors in better ways together with Professor Örjan Danielsson.

Please feel free to contact me if you are interested in starting a collaboration or participating in a research project.

A picture of materials made with CVD. Olov Planthaber

Teaching

I teach chemistry at both basic and advanced levels. You will meet me in introductory courses in general chemistry and inorganic chemistry at the bachelor level, as well as in materials chemistry courses at the masters level.
My core philosophy in chemistry education is that “learning chemistry is learning to think chemically”, and I want to give you the tools to develop your own intuitive sense for chemistry. I continually try to show how many aspects of chemistry can be traced back to a few simple fundamental principles, such as electronegativity or atomic and molecular orbitals. I also strive to explain how much one can understand a molecule simply from its structure.

News and media

Iridescent disc on net.

Successful outcomes for IFM's materials research in WASP-WISE pilot call

WASP and WISE have recently awarded grants to nine collaborative projects, three of which include participants from the Department of Physics, Chemistry and Biology (IFM) at Linköping University.

Person holding a small iridescent disc with tweezers.

Better digital memories with the help of noble gases

The electronics of the future can be made even smaller and more efficient by getting more memory cells to fit in less space. One way to achieve this is by adding the noble gas xenon when manufacturing digital memories.

Building from the outside, signpost

Interdisciplinary research on IVA’s 100 List

Five research projects from LiU are on the 100 List of the Royal Swedish Academy of Engineering Sciences (IVA). The list pulls together projects with great potential to create value in society.

Podcasts in English

Green CVD: How Sustainable is Thin Film Deposition? 

In this podcast Henrik Pedersen, Sean Barry, and Jonas Sundqvist talk about their publication in JVSTA about Green CVD. They discuss a new research field, more sustainable thin film deposition practices and more.

Swedish language videos and podcasts

Research

Organisation

Publications

2025

Pamburayi Mpofu, Tommy Larsson, Oscar Alm, Jonas Lauridsen, Kenichiro Mizohata, Ben F. Spencer, Hans Högberg, Kostas Sarakinos, Henrik Pedersen (2025) On the reliability of Vegard's law in compositional analysis of chemical vapor deposited AlxTi1-xN Surface & Coatings Technology, Vol. 518, Article 132898 (Article in journal) Continue to DOI
Henrik Pedersen (2025) Halvledaråldern: kemin bakom dagens teknik
Premrudee Promdet, Pentti Niiranen, Simon Lagerkvist, Daniel Lundin, Henrik Pedersen (2025) Self-limiting deposition of copper from copper beta-diketonates and plasma electrons Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, Vol. 43, Article 040402 (Article in journal) Continue to DOI
Pamburayi Mpofu, Pentti Niiranen, Oscar Alm, Jonas Lauridsen, Tommy Larsson, Henrik Pedersen (2025) Atomic layer deposition of AlxTi1-xN via co-evaporation of metal precursors Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, Vol. 43, Article 032405 (Article in journal) Continue to DOI
Arun Haridas Choolakkal, Pamburayi Mpofu, Pentti Niiranen, Jens Birch, Henrik Pedersen (2025) Using a Heavy Inert Diffusion Additive for Superconformal Atomic Layer Deposition The Journal of Physical Chemistry Letters, Vol. 16, p. 2369-2372 (Article in journal) Continue to DOI
Arun Haridas Choolakkal, Ingemar Persson, Jarkko Etula, Emma Salmi, Taneli Juntunen, Per O A Persson, Jens Birch, Henrik Pedersen (2025) Conformal chemical vapor deposition of B4C thin films onto carbon nanotubes Nanoscale, Vol. 17, p. 5961-5971 (Article in journal) Continue to DOI
Nathan O'brien, Henrik Pedersen (2025) Triazenide based metal precursors for vapour deposition Dalton Transactions, Vol. 54, p. 2709-2717 (Article, review/survey) Continue to DOI
Pentti Niiranen, Felicia Andersson, Daniel Lundin, Lars Ojamäe, Henrik Pedersen (2025) Plasma decomposition of ferrocene Journal of Chemical Physics, Vol. 162, Article 034703 (Article in journal) Continue to DOI

2024

Arun Haridas Choolakkal, Pentti Niiranen, Samira Dorri, Jens Birch, Henrik Pedersen (2024) Competitive co-diffusion as a route to enhanced step coverage in chemical vapor deposition Nature Communications, Vol. 15 (Article in journal) Continue to DOI
Pamburayi Mpofu, Houyem Hafdi, Jonas Lauridsen, Oscar Alm, Tommy Larsson, Henrik Pedersen (2024) A mass spectrometrical surface chemistry study of aluminum nitride ALD from tris-dimethylamido aluminum and ammonia Materials Advances, Vol. 5, p. 9259-9269 (Article in journal) Continue to DOI
Sachin Sharma, Laurent Souqui, Justinas Palisaitis, Duc Quang Hoang, Ivan Gueorguiev Ivanov, Per O A Persson, Hans Högberg, Henrik Pedersen (2024) On the origin of epitaxial rhombohedral-B4C growth by CVD on 4H-SiC Dalton Transactions, Vol. 53, p. 10730-10736 (Article in journal) Continue to DOI
Pamburayi Mpofu, Houyem Hafdi, Pentti Niiranen, Jonas Lauridsen, Oscar Alm, Tommy Larsson, Henrik Pedersen (2024) Surface chemistry in atomic layer deposition of AlN thin films from Al(CH3)3 and NH3 studied by mass spectrometry Journal of Materials Chemistry C, Vol. 12, p. 12818-12824 (Article in journal) Continue to DOI
Collin Rowe, Ankit Kashyap, Geetu Sharma, Naveen Goyal, Johan G. Alauzun, Sean T. Barry, Narayanan Ravishankar, Ajay Soni, Per Eklund, Henrik Pedersen, Ganpati Ramanath (2024) Nanomolecularly-induced Effects at Titania/Organo-Diphosphonate Interfaces for Stable Hybrid Multilayers with Emergent Properties ACS Applied Nano Materials, Vol. 7, p. 11225-11233 (Article in journal) Continue to DOI
Sachin Sharma, Justinas Palisaitis, Ivan Gueorguiev Ivanov, Per O Å Persson, Henrik Pedersen, Hans Högberg (2024) The Influence of Carbon on Polytype and Growth Stability of Epitaxial Hexagonal Boron Nitride Films Advanced Materials Interfaces, Vol. 11, Article 2400091 (Article in journal) Continue to DOI
Pentti Niiranen, Anna Kapran, Hama Nadhom, Martin Cada, Zdenek Hubicka, Henrik Pedersen, Daniel Lundin (2024) Plasma electron characterization in electron chemical vapor deposition Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, Vol. 42, Article 023006 (Article in journal) Continue to DOI