I am a chemist working on material synthesis of nanoscale thin films using time-resolved and surface controlled Chemical Vapour Deposition (CVD).

Chemical vapour deposition is a fundamental process in much of today's coatings industry, and is used across a wide swath of areas, from the manufacture of advanced microelectronics, to photochromic windows, to metal cutting tools.

Henrik PedersenMy research focuses on understanding the chemistry in Chemical Vapour Deposition (CVD) processes, and on how CVD can be improved by controlling the fourth dimension – time – as well as the surface chemistry in CVD in order to meet the demands both for higher precision thin film deposition at lower temperatures in the electronics industry, and the urge for new materials in materials science and engineering.

Chemical Vapour Deposition projects

At Linköping University, the Chemistry-, Semiconductor Materials-, and Thin Film Physics research groups at the Department of Physics, Chemistry and Biology, conduct a number of world class, high-impact, high-expertise projects using CVD techniques.

One of the current research projects explore how various types of time-resolved CVD and novel precursor molecules can be used to improve the material quality, and thereby the performance of, electronic devices based on the group 13-nitrides; AlN, GaN, InN, and their alloys. Here we will explore the most well-known time-resolved CVD technique; Atomic Layer Deposition (ALD) and expand the common ALD routes of time-resolved precursor supply, to time-resolved energy supply to a continuous precursor supply with time-resolved plasma discharges. We also develop new precursor molecules for both the group 13 metals and nitrogen. This project is done in close collaboration with Prof. Seán Barry at Carleton University in Ottawa, Canada.

Thermal ALD

In another project we are developing a time-resolved, surface controlled plasma CVD method for depositing metal films. We will here use the electrons in a plasma as reducing agents for metal centres with a positive oxidation state in the precursor molecules. This research is done in collaboration with Dr. Daniel Lundin at Université Paris-Sud, France and Assoc. Professor Kostas Sarakinos at Linköping University.

We also work with boron carbide as a detection material for neutrons. Since neutrons are electrically neutral they are very hard to detect and need to be converted to a charged particle for detection. This is done by letting the neutron undergo reactions with e.g. to 10B or 157Gd isotopes so that charged particles are produced. A thin film with a high concentration of the 10B isotope can form the basis of such a neutron detector. This interesting research is conducted together with Prof. Jens Birch at Linköping University, and the European Spallation Source facility, which is under construction in Lund in the south of Sweden.


SEM sample

I am always looking for highly skilled graduate students and post-doctoral researchers who are interested in surface- and materials chemistry, and are willing to work in a highly cross-disciplinary environment with opportunities to collaborate with materials scientists and physicists.

Linköping University hosts a highly effective research infrastructure, with a plethora of materials characterization expertise and equipment, as well as highly advanced equipment for materials deposition. Working here makes it very easy to collaborate, since we mix materials chemists, physicists, and theoretical physicists within a single department.

I am open to most sources of collaboration, both within academia and with the industry.

Teaching activities

I lecture at a number of courses in general chemistry, inorganic chemistry, environmental chemistry and thin film deposition, all at Linköping University.

Online Details

Twitter: @hacp81

ORCID: 0000-0002-7171-5383


Academic positions 

  • Visiting Professor, Department of Chemistry, Carleton University, Ottawa, Canada, Apr – Jun 2016
  • Assistant Professor (Sw. Forskarassistent), Semiconductor materials, Linköping University, Jul 2011 – Sep 2012
  • Post doc, Semiconductor materials, Linköping University, Jun 2010 – Jun 2011
  • Research Engineer, Coating Technology, Sandvik Tooling, Stockholm Jan 2009 – May 2010
  • PhD-student in Chemistry/Materials Science, Linköping University, Jun 2004 – Dec 2008 

Download full CV (pdf)


Research grants as main applicant

  • April 2016, 0.1 MSEK, CeNano, LiU, Self-limiting surface chemistry by in situ spectroscopic ellipsometry, one year project
  • November 2015, 4 MSEK, Vetenskapsrådet, Self-limiting deposition of transition metal thin films by pulsed plasma chemistry, four year project
  • June 2011, 0.2 MSEK, Ångpanneföreningens Forskningsstiftelse (ÅForsk), Synthesis of multifunctional carbon layers, three year project
  • November 2010, 0.5 MSEK, Vinnova, A new type of plasma activated CVD-process, one year feasibility project

Invited international lectures

Sample invited international lectures

  • American Chemical Society Spring Meeting, San Francisco, USA, April 2017, “Time is of the essence: using the fourth dimension to improve CVD”
  • Workshop on Simulation of chemistry-driven growth phenomena for metastable materials, Schloss Rauischholzhausen, Marburg, Germany, November 2015, “Modeling Chemical Vapour Deposition: An experimentalist’s view”
  • 13th International Ceramics Congress (CIMTEC 2014), June 2014, Montecatini Terme, Italy, “High power pulsed plasma enhanced chemical vapor deposition”



Pontus Stenberg, Ian Don Booker, Robin Karhu, Henrik Pedersen, Erik Janzén, Ivan Gueorguiev Ivanov

Defects in silicon carbide grown by fluorinated chemical vapor deposition chemistry

In Physica. B, Condensed matter

Article in journal

Mikhail Chubarov, Hans Högberg, Anne Henry, Henrik Pedersen

Challenge in determining the crystal structure of epitaxial 0001 oriented sp(2)-BN films

In Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films

Article, review/survey

Mewlude Imam, Carina Höglund, Susann Schmidt, Richard Hall-Wilton, Jens Birch, Henrik Pedersen

Plasma CVD of hydrogenated boron-carbon thin films from triethylboron

In Journal of Chemical Physics

Article in journal