Plasma Theory and Diagnostics for Thin Film Deposition
The use of pulsed plasma pulses to sputter material it allows the deposition of thin films with unmatched density and quality. We are helping to further improve the quality of films deposited by investigating the underlying theory of pulsed plasmas, their characterisation by innovative in-situ methods and exploitation in the deposition of novel thin films.
Deposition of Anisotropic Nanoparticle Arrays
The division made the discovery that the application of a pulse plasma combined with a hollow cathode and applied magnetic field allows the formation of unique structures, see above. Our aim is to exploit these structures to enable improved performance for real world applications, for example water splitting for energy storage.
