Nano-materials Science unit

LiU logo consisting of GaN nanorods selected grown onto the patterned area on a Si substrate by magnetron sputter epitaxy
The image shows a LiU logo consisted of GaN nanorods grown onto the patterned area on a Si substrate by magnetron sputter epitaxy. The LiU logo pattern was created a TiNx mask grown on the Si substrate using focused ion beam lithography technique.

The Nano Materials Science group in the Thin Film Physics division is conducting focused research aiming at understanding and controlling atomistic processes during synthesis of nanostructures and thin films. The common goal is to create new processes and materials to provide unique materials properties for society to exploit.

Some examples:
  • InAlN and GaN nanorods, quantum dots, and heterostructures for LED applications
  • Wide band-gap BN-epilayers for electronics and neutron detectors
  • Wurtzite group-3A group-3B Nitrides with enhanced piezo-electric properties
  • Low-temperature growth of boron carbide for state-of-the-art neutron detectors at ESS
  • Quasicrystalline thin films providing unique combinations of physical properties
  • Superlattices and multilayers with sub-nm layers and atomically abrupt interfaces

ContactShow/Hide content

Back to Thin Film PhysicsShow/Hide content