Nano-materials Science unit

The image shows a LiU logo consisted of GaN nanorods grown onto the patterned area on a Si substrate by magnetron sputter epitaxy. The LiU logo pattern was created a TiNx mask grown on the Si substrate using focused ion beam lithography technique.

The Nano Materials Science group in the Thin Film Physics division is conducting focused research aiming at understanding and controlling atomistic processes during synthesis of nanostructures and thin films. The common goal is to create new processes and materials to provide unique materials properties for society to exploit.

Some examples:

InAlN and GaN nanorods, quantum dots, and heterostructures for LED applications
Wide band-gap BN-epilayers for electronics and neutron detectors
Wurtzite group-3A group-3B Nitrides with enhanced piezo-electric properties
Low-temperature growth of boron carbide for state-of-the-art neutron detectors at ESS
Quasicrystalline thin films providing unique combinations of physical properties
Superlattices and multilayers with sub-nm layers and atomically abrupt interfaces

Contact

Research leader

Staff

Jens Birch

Professor, Head of Unit

Arun Haridas Choolakkal

Samira Dorri

Naureen Ghafoor

Associate Professor, Docent

Ray-Hua Horng

Ching-Lien Hsiao

Associate Professor, Docent

Olle Nyqvist

Diploma student

Back to Thin Film Physics

The image shows a plasma in a coating equipment

Thin Film Physics (TUNNF)

The research in our division concerns design of new multifunctional materials for hard and wear-resistant coatings, energy materials, magnetic materials, electronics, optics, neutron-converting materials, wide-bandgap semiconductors, and more.