Materials Optics unit

Photographer: Olov Planthaber

Materials Optics is a unit under the Thin Film Physics Division. We combine material optics and development of ellipsometric methodology to analyse optical properties and nanostructures of bulk materials, thin films and their interfaces. Our main technique is spectroscopic ellipsometry which is based on analysis of changes in the state of polarization of light interacting with matter.

Our goal is to study advanced nanostructures by methods based on polarization optics and to contribute to the development of novel optical materials and devices. Our present research activities include studies of biological materials. We are especially interested in polarizing assemblies such as the Bouligand structure found in arthropods and stomatopods. We are also involved in biomimetic research where we fabricate photonic structures and meta-materials inspired by the studies of biological materials. We are using different techniques to realize the structures, in most cases thin film deposition by magnetron sputtering. In another project route is to explore the possibilities to use liquid crystal based optical elements for novel optical components including lenses with variable focal distance, switchable phase arrays and beam steering devices.

In our lab, The LiU Spectroscopic Ellipsometry Laboratory (The LiUSE-lab) we have a collection of excellent research grade instruments for optical polarization studies including a Mueller matrix dual rotating compensator ellipsometer (RC2, range: 210-1690 nm /0,7-5,9 eV), a Mueller matrix dual rotating compensator ellipsometer for in-situ use (RC2, range: 245-1690 nm /0,7-5,1 eV), a variable angle spectroscopic ellipsometer (VASE, range: 190-1690 nm / 0.7-6.5 eV) and an infrared variable angle spectroscopic ellipsometer (IR-VASE, range: 1.7-30 μm / 333-5900 1/cm). All instruments from J.A. Woollam Co. Together with our colleagues in the Terahertz Materials Analysis Center (THeMAC) we have ellipsometry equipment spanning a wavelength range from 190 nm to 3 mm.

Photo credit Olov Planthaber

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Publications

2025

Shailesh Kalal, Martin Magnuson, Alessandro Chesini, Akshaya A, Sanath Kumar Honnali, Sophia Sahoo, Nakul Jain, Dibyendu Bhattacharyya, Andrei Gloskovskii, Mukul Gupta, Feng Wang, Michele Orlandi, Grzegorz Greczynski, Kenneth Järrendahl, Per Eklund, Jens Birch, Ching-Lien Hsiao (2025) Defect Engineering in Ti-Doped Ta3N5 Thin Films for Enhanced Photoelectrochemical Water Splitting: Electronic Structure Modulation and Charge Carrier Dynamics Small Structures, Article e202500504 (Article in journal) Continue to DOI
Anton Zubayer, T. Hanashima, J. Sugiyama, A. David, Xianjie Liu, Naureen Ghafoor, J. Stahn, A. Glavic, Y. Murakami, T. Takehiro, Y. Tomita, M. Auchi, Jens Birch, Mats Fahlman, Fredrik Eriksson (2025) Magnetic hysteresis control in thin film Fe/Si multilayers by incorporation of B4C Materials & design, Vol. 257, Article 114387 (Article in journal) Continue to DOI
Anton Zubayer, Fredrik Eriksson, Naureen Ghafoor, Jochen Stahn, Jens Birch, Artur Glavic (2025) Optimization of magnetic reference layer for neutron reflectometry Journal of applied crystallography, Vol. 58, p. 1299-1310 (Article in journal) Continue to DOI
Sheng-Ti Chung, Catherine Langpoklakpam, Yicong Dong, Yi-Kai Hsiao, Shaloo Rakheja, Hao-Chung Kuo, Dong-Sing Wuu, Kenneth Järrendahl, Ching-Lien Hsiao, Edmund Dobrocka, Milan Tapajna, Filip Gucmann, Ray-Hua Horng (2025) Effect of the AlGaO Spacer Layer on the Performance of ß-Gallium Oxide Metal-Oxide Semiconductor Field Effect Transistors Advanced Electronic Materials, Vol. 11, Article e00291 (Article in journal) Continue to DOI
Gulzada Beket, Anton Zubayer, Leonie Pap, Huagui Lai, Samiran Bairagi, Nakul Jain, Jochen Stahn, Fan Fu, Kenneth Järrendahl, Fredrik Eriksson, Xabier Rodriguez-Martinez, Olle Inganäs, Uli Wuerfel, Thomas Osterberg, Jonas Bergqvist, Feng Gao (2025) Understanding and Addressing the Performance Asymmetry Issue in Semitransparent Laminated Organic Photovoltaic Devices Advanced Functional Materials (Article in journal) Continue to DOI

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