Pamburayi Mpofu
Förste forskningsingenjör
Publikationer
2026
Atomic layer deposition of gallium oxide using gallium triazenide and water
Materials Advances, Vol. 7, s. 2874-2881
(Artikel i tidskrift)
https://dx.doi.org/10.1039/d5ma01213a
Surface Chemistry in the Initial Stages of Titanium Nitride Atomic Layer Deposition Using Operando Ambient Pressure X-ray Photoelectron Spectroscopy
Chemistry of Materials
(Artikel i tidskrift)
https://dx.doi.org/10.1021/acs.chemmater.5c02974
2025
On the reliability of Vegard's law in compositional analysis of chemical vapor deposited AlxTi1-xN
Surface & Coatings Technology, Vol. 518, Artikel 132898
(Artikel i tidskrift)
https://dx.doi.org/10.1016/j.surfcoat.2025.132898
Divide in Time to Conquer the Surface: ALD Studies to Understand Surface Chemistry of AlxTi1-xN CVD
(Doktorsavhandling, sammanläggning)
https://dx.doi.org/10.3384/9789181182248
Atomic layer deposition of AlxTi1-xN via co-evaporation of metal precursors
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, Vol. 43, Artikel 032405
(Artikel i tidskrift)
https://dx.doi.org/10.1116/6.0004420