Plasma och ytbeläggningsfysik (PLASM)

Vi är en innovativ grupp som ligger i framkant inom forskningen i avancerade plasmatekniker. Vårt mål är att möta stora utmaningar som samtida materialvetenskap och teknik står inför. Genom en kombination av experimentella och teoretiska verktyg försöker vi förstå och utnyttja interaktionen mellan process, plasma och material.

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Svepelektronmikroskopbild strukturer av sammankopplade järnnanopartiklar. Infogad bild visar enskilda järnnanopartiklar. 

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Senaste publikationer

2024

Pentti Niiranen, Anna Kapran, Hama Nadhom, Martin Cada, Zdenek Hubicka, Henrik Pedersen, Daniel Lundin (2024) Plasma electron characterization in electron chemical vapor deposition Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, Vol. 42, Artikel 023006 Vidare till DOI
Clara Linder, Smita Gangaprasad Rao, Robert Boyd, Grzegorz Greczynski, Per Eklund, Sara Munktell, Arnaud Le Febvrier, Emma Björk (2024) Effect of Mo content on the corrosion resistance of (CoCrFeNi)1−xMox thin films in sulfuric acid Thin Solid Films, Vol. 790, Artikel 140220 Vidare till DOI
Daria Pankratova, Khabib Yusupov, Alberto Vomiero, Sanath Kumar Honnali, Robert Boyd, Daniele Fournier, Sebastian Ekeroth, Ulf Helmersson, Clio Azina, Arnaud Le Febvrier (2024) Enhanced Thermoelectric Properties by Embedding Fe Nanoparticles into CrN Films for Energy Harvesting Applications ACS Applied Nano Materials, Vol. 7, s. 3428-3435 Vidare till DOI

2023

P. Klein, J. Hnilica, Daniel Lundin, P. Dvorak, Michal Zanaska, Ulf Helmersson, P. Vasina (2023) Temporal, spatial and spectroscopic study of plasma emission on Cu target in bipolar HiPIMS Plasma sources science & technology, Vol. 32, Artikel 075019 Vidare till DOI
H. Hajihoseini, N. Brenning, M. Rudolph, M. A. Raadu, Daniel Lundin, Joel Fischer, T. M. Minea, J. T. Gudmundsson (2023) Target ion and neutral spread in high power impulse magnetron sputtering Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, Vol. 41, Artikel 013002 Vidare till DOI
Hao Du, Michal Zanaska, Ulf Helmersson, Daniel Lundin (2023) On selective ion acceleration in bipolar HiPIMS: A case study of (Al,Cr)2O3 film growth Surface & Coatings Technology, Vol. 454, Artikel 129153 Vidare till DOI
Smita Gangaprasad Rao, Pascal Manuel Illgner, Robert Boyd, Gyula Nagy, Philippe Djemia, Daniel Primetzhofer, Ivan Petrov, Arnaud Le Febvrier, Per Eklund (2023) Low temperature epitaxial growth of Cantor-nitride thin films by magnetic field assisted magnetron sputtering Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, Vol. 41, Artikel 053415 Vidare till DOI
V. G. Antunes, M. Rudolph, A. Kapran, H. Hajihoseini, M. A. Raadu, Nils Brenning, J. T. Gudmundsson, Daniel Lundin, T. Minea (2023) Influence of the magnetic field on the extension of the ionization region in high power impulse magnetron sputtering discharges Plasma sources science & technology, Vol. 32, Artikel 075016 Vidare till DOI
Jui-Che Chang, Eric Nestor Tseng, Yi-Ling Lo, Sanjay Kumar Nayak, Daniel Lundin, Per O. Å. Persson, Ray-Hua Horng, Lars Hultman, Jens Birch, Ching-Lien Hsiao (2023) HiPIMS-grown AlN buffer for threading dislocation reduction in DC-magnetron sputtered GaN epifilm on sapphire substrate Vacuum, Vol. 217, Artikel 112553 Vidare till DOI
Swetha Suresh Babu, Martin Rudolph, Peter John Ryan, Joel Fischer, Daniel Lundin, James W. Bradley, Jon Tomas Gudmundsson (2023) High power impulse magnetron sputtering of tungsten: a comparison of experimental and modelling results Plasma sources science & technology, Vol. 32, Artikel 034003 Vidare till DOI
Hao Du, Rui Shu, Robert Boyd, Arnaud Le Febvrier, Ulf Helmersson, Per Eklund, Daniel Lundin (2023) Evolution of microstructure and properties of TiNbCrAlHfN films grown by unipolar and bipolar high-power impulse magnetron co-sputtering: The role of growth temperature and ion bombardment Surface & Coatings Technology, Vol. 459, Artikel 129389 Vidare till DOI
Tun-Wei Hsu, Grzegorz Greczynski, Bjarke Holl Christensen, Klaus Pagh Almtoft, Robert Boyd, Szilárd Kolozsvári, Peter Polcik, Stephan Bolz, Werner Kölker, Christoph Schiffers, Biljana Mesic, Magnus Odén (2023) Effects of substrate rotation during AlSi-HiPIMS/Ti-DCMS co-sputtering growth of TiAlSiN coatings on phase content, microstructure, and mechanical properties Surface & Coatings Technology, Vol. 453, Artikel 128986 Vidare till DOI
Sanath Kumar Honnali, Charlotte Poterie, Arnaud Le Febvrier, Daniel Lundin, Grzegorz Greczynski, Per Eklund (2023) Effect of tilted closed-field magnetron design on the microstructure and mechanical properties of TiZrNbTaN coatings Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, Vol. 41, Artikel 043402 Vidare till DOI
Hao Du, Rui Shu, Robert Boyd, Arnaud Le Febvrier, Mauricio A. Sortica, Daniel Primetzhofer, Ulf Helmersson, Per Eklund, Daniel Lundin (2023) Corundum-structured AlCrNbTi oxide film grown using high-energy early-arriving ion irradiation in high-power impulse magnetron sputtering Scripta Materialia, Vol. 234, Artikel 115578 Vidare till DOI
Pentti Niiranen, Hama Nadhom, Michal Zanaska, Robert Boyd, Mauricio Sortica, Daniel Primetzhofer, Daniel Lundin, Henrik Pedersen (2023) Biased quartz crystal microbalance method for studies of chemical vapor deposition surface chemistry induced by plasma electrons Review of Scientific Instruments, Vol. 94, Artikel 023902 Vidare till DOI
Max Renner, Joel Fischer, H. Hajihoseini, J. T. Gudmundsson, M. Rudolph, Daniel Lundin (2023) Angular distribution of titanium ions and neutrals in high-power impulse magnetron sputtering discharges Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, Vol. 41, Artikel 033009 Vidare till DOI
Joel Fischer, Max Renner, J. T. Gudmundsson, M. Rudolph, H. Hajihoseini, Nils Brenning, Daniel Lundin (2023) Insights into the copper HiPIMS discharge: deposition rate and ionised flux fraction Plasma sources science & technology, Vol. 32, Artikel 125006 Vidare till DOI
Zhixing Wu, Mikhail Vagin, Robert Boyd, Penghui Ding, Oleksandr Pshyk, Grzegorz Greczynski, Magnus Odén, Emma Björk (2023) Selectivity Control of Oxygen Reduction Reaction over Mesoporous Transition Metal Oxide Catalysts for Electrified Purification Technologies ACS Applied Materials and Interfaces, Vol. 15, s. 26093-26103 Vidare till DOI
Smita Gangaprasad Rao, Boburjon Mukhamedov, Gyula Nagy, Eric Nestor Tseng, Rui Shu, Robert Boyd, Daniel Primetzhofer, Per O A Persson, Björn Alling, Igor Abrikosov, Arnaud Le Febvrier, Per Eklund (2023) Phase formation in CrFeCoNi nitride thin films Physical Review Materials, Vol. 7, Artikel 055002 Vidare till DOI

2022

Janella Salamania, Davide Giuseppe Sangiovanni, A. Kraych, K.M. Calamba Kwick, I.C. Schramm, L.J.S. Johnson, Robert Boyd, Babak Bakhit, Tun-Wei Hsu, M. Mrovec, Lina Rogström, Ferenc Tasnadi, Igor A. Abrikosov, Magnus Odén (2022) Elucidating dislocation core structures in titanium nitride through high-resolution imaging and atomistic simulations Materials & design, Vol. 224, Artikel 111327 Vidare till DOI

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